Avoiding Shading Losses in Concentrator Photovoltaics Using a Soft-Imprinted Cloaking Geometry

Shading losses are a longstanding obstacle in photovoltaic devices, particularly concentrator photovoltaics, where the tradeoff between shading and resistive limits concentration at which highest power conversion efficiency is achieved to values far below capabilities of optics. Here, we demonstrate simple scalable fabrication method that enables large front metal coverage while keeping minimum. Soft-imprint lithography used create trenches transparent polymer above contacts, enabling cloaking via refraction range angles near normal incidence. Using optical characterization techniques, first confirm contacts indeed optically cloaked. We then an increase short-circuit current density from 29.95 39.12 mA/cm 2 for Si solar cell with 25% before after patterning, respectively. investigate angular performance trench pattern further how such strategy could be implemented photovoltaics enable peaks concentrations beyond 1000 suns.